Self-Resonant Microlasers of Colloidal Quantum Wells Constructed by Direct Deep Patterning

Here, the first account of self-resonant fully-colloidal u-lasers made from colloidal quantum well (CQW) solution is reported. A deep patterning technique developed to fabricate well-defined high aspect-ratio on-chip CQW resonators grating waveguides and in-plane reflectors. CQWs patterned layers are closed-packed with sharp edges residual-free lifted-off surfaces. Additionally, method successfully applied various nanoparticles including dots metal nanoparticles. It observed that process does not affect nanocrystals (NCs) immobilized in attained patterns different physical chemical properties NCs remain pristine. Thanks capability proposed method, sub-wavelength lateral feature size micron-scale height fabricated aspect ratios 1:15 (<100 nm features >1.5 {\mu}m film thickness). The waveguide-coupled laser, enabling tight optical confinement, assures lasing. spectral characteristics designed resonator structure supported a numerical model full electromagnetic solutions. Such directly deep-patterned hold great promise for integration photonic circuits.